Doi, T., Marinescu, I. D., & Syuhei Kurokawa. (2011). Advances in CMP polishing technologies. Reino Unido: William Andrew Publishing.
Chicago Style CitationDoi, Toshiro, Ioan D. Marinescu, and Syuhei Kurokawa. Advances in CMP Polishing Technologies. Reino Unido: William Andrew Publishing, 2011.
MLA CitationDoi, Toshiro, Ioan D. Marinescu, and Syuhei Kurokawa. Advances in CMP Polishing Technologies. Reino Unido: William Andrew Publishing, 2011.
Warning: These citations may not always be 100% accurate.