Cita APA

Doi, T., Marinescu, I. D., & Syuhei Kurokawa. (2011). Advances in CMP polishing technologies. Reino Unido: William Andrew Publishing.

Citación estilo Chicago

Doi, Toshiro, Ioan D. Marinescu, y Syuhei Kurokawa. Advances in CMP Polishing Technologies. Reino Unido: William Andrew Publishing, 2011.

Cita MLA

Doi, Toshiro, Ioan D. Marinescu, y Syuhei Kurokawa. Advances in CMP Polishing Technologies. Reino Unido: William Andrew Publishing, 2011.