Cita APA

Arrieta Navarro, J. P. 1. (2012). Resolution improvements on poly(methyl methacrylate) as electron-beam lithography resist. [San José], Costa Rica.

Citación estilo Chicago

Arrieta Navarro, José Pablo 1987-. Resolution Improvements On Poly(methyl Methacrylate) As Electron-beam Lithography Resist. [San José], Costa Rica, 2012.

Cita MLA

Arrieta Navarro, José Pablo 1987-. Resolution Improvements On Poly(methyl Methacrylate) As Electron-beam Lithography Resist. [San José], Costa Rica, 2012.