Resolution improvements on poly(methyl methacrylate) as electron-beam lithography resist /
| Autor principal: | |
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| Formato: | Tesis Libro |
| Lenguaje: | English |
| Publicado: |
[San José], Costa Rica,
2012.
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| Materias: |
Sistema de Bibliotecas de la Universidad de Costa Rica
| Copia | Disponible |
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