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130626s2013 gw | s |||| 0|eng d |
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|a 9783642365355
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|a 10.1007/978-3-642-36535-5
|2 doi
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|a Sistema de Bibliotecas del Tecnológico de Costa Rica
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|a High Permittivity Gate Dielectric Materials /
|c edited by Samares Kar.
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|a 1st ed. 2013.
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|a Berlin, Heidelberg :
|b Springer Berlin Heidelberg :
|b Imprint: Springer,
|c 2013.
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|a XXXII, 489 p. 325 illus., 168 illus. in color. :
|b online resource.
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Springer Series in Advanced Microelectronics,
|v 43
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|a Historical Perspectives -- High Mobility Channels -- Non-Volatile Memory -- Hafnium-Based Gate Dielectric Materials -- Lanthanum-Based High-K Gate Dielectric Materials -- Crystalline High-K Gate Dielectric Materials -- High-K Gate Dielectric Processing.- Metal Gate Electrodes -- Flat-Band/Threshold Voltage Control -- Interfaces and Defects -- Electrical Characterization and Parameter Extraction -- Non-Contact Metrology of High-K Gate Dielectrics -- Channel Mobility -- High-K Gate Dielectric Reliability Issues -- Bias Temperature Instability -- Integration Issues. .
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|a Electronics.
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|a Microelectronics.
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|a Optical materials.
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|a Electronic materials.
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|a Solid state physics.
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|a Spectroscopy.
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|a Microscopy.
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|a Engineering.
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|a Electronics and Microelectronics, Instrumentation.
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|a Optical and Electronic Materials.
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|a Solid State Physics.
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|a Spectroscopy and Microscopy.
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|a Engineering, general.
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|a Kar, Samares.
|e editor.
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|a SpringerLink (Online service)
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|t Springer eBooks
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