High Permittivity Gate Dielectric Materials /
Autor Corporativo: | |
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Otros Autores: | |
Formato: | eBook |
Lenguaje: | English |
Publicado: |
Berlin, Heidelberg :
Springer Berlin Heidelberg : Imprint: Springer,
2013.
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Edición: | 1st ed. 2013. |
Colección: | Springer Series in Advanced Microelectronics,
43 |
Materias: |
Tabla de Contenidos:
- Historical Perspectives
- High Mobility Channels
- Non-Volatile Memory
- Hafnium-Based Gate Dielectric Materials
- Lanthanum-Based High-K Gate Dielectric Materials
- Crystalline High-K Gate Dielectric Materials
- High-K Gate Dielectric Processing.- Metal Gate Electrodes
- Flat-Band/Threshold Voltage Control
- Interfaces and Defects
- Electrical Characterization and Parameter Extraction
- Non-Contact Metrology of High-K Gate Dielectrics
- Channel Mobility
- High-K Gate Dielectric Reliability Issues
- Bias Temperature Instability
- Integration Issues. .