High Permittivity Gate Dielectric Materials /

Detalles Bibliográficos
Autor Corporativo: SpringerLink (Online service)
Otros Autores: Kar, Samares. (Editor )
Formato: eBook
Lenguaje:English
Publicado: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2013.
Edición:1st ed. 2013.
Colección:Springer Series in Advanced Microelectronics, 43
Materias:
Tabla de Contenidos:
  • Historical Perspectives
  • High Mobility Channels
  • Non-Volatile Memory
  • Hafnium-Based Gate Dielectric Materials
  • Lanthanum-Based High-K Gate Dielectric Materials
  • Crystalline High-K Gate Dielectric Materials
  • High-K Gate Dielectric Processing.- Metal Gate Electrodes
  • Flat-Band/Threshold Voltage Control
  • Interfaces and Defects
  • Electrical Characterization and Parameter Extraction
  • Non-Contact Metrology of High-K Gate Dielectrics
  • Channel Mobility
  • High-K Gate Dielectric Reliability Issues
  • Bias Temperature Instability
  • Integration Issues.  .