High Permittivity Gate Dielectric Materials /
| Corporate Author: | |
|---|---|
| Other Authors: | |
| Format: | eBook |
| Language: | English |
| Published: |
Berlin, Heidelberg :
Springer Berlin Heidelberg : Imprint: Springer,
2013.
|
| Edition: | 1st ed. 2013. |
| Series: | Springer Series in Advanced Microelectronics,
43 |
| Subjects: |
Table of Contents:
- Historical Perspectives
- High Mobility Channels
- Non-Volatile Memory
- Hafnium-Based Gate Dielectric Materials
- Lanthanum-Based High-K Gate Dielectric Materials
- Crystalline High-K Gate Dielectric Materials
- High-K Gate Dielectric Processing.- Metal Gate Electrodes
- Flat-Band/Threshold Voltage Control
- Interfaces and Defects
- Electrical Characterization and Parameter Extraction
- Non-Contact Metrology of High-K Gate Dielectrics
- Channel Mobility
- High-K Gate Dielectric Reliability Issues
- Bias Temperature Instability
- Integration Issues. .