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130107s2013 gw | s |||| 0|eng d |
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|a 9783642344282
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| 024 |
7 |
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|a 10.1007/978-3-642-34428-2
|2 doi
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| 040 |
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|a Sistema de Bibliotecas del Tecnológico de Costa Rica
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| 100 |
1 |
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|a Zhou, Weimin.
|e author.
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|a Nanoimprint Lithography: An Enabling Process for Nanofabrication /
|c by Weimin Zhou.
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| 250 |
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|a 1st ed. 2013.
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| 260 |
# |
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|a Berlin, Heidelberg :
|b Springer Berlin Heidelberg :
|b Imprint: Springer,
|c 2013.
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| 300 |
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|a XIII, 249 p. 225 illus., 107 illus. in color. :
|b online resource.
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| 336 |
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|a text
|b txt
|2 rdacontent
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| 337 |
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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|a Principles and statues of nanoimprint lithography -- Stamp Fabrication -- stamp surface treatment -- Nanoimprint lithography resists -- Nanoimprint lithography process -- Modeling and Simulation of NIL -- Application of NIL in Light emitting Diodes -- Application of NIL in memory devices -- Application of NIL in solar cell.
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| 650 |
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|a Nanotechnology.
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| 650 |
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|a Optical materials.
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| 650 |
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|a Electronic materials.
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| 650 |
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|a Nanochemistry.
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| 650 |
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4 |
|a Nanotechnology and Microengineering.
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| 650 |
2 |
4 |
|a Optical and Electronic Materials.
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| 650 |
2 |
4 |
|a Nanotechnology.
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| 650 |
2 |
4 |
|a Nanochemistry.
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| 710 |
2 |
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|a SpringerLink (Online service)
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| 773 |
0 |
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|t Springer eBooks
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| 900 |
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|a Libro descargado a ALEPH en bloque (proveniente de proveedor)
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