Nanoimprint Lithography: An Enabling Process for Nanofabrication /

Detalles Bibliográficos
Autor principal: Zhou, Weimin. (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: eBook
Lenguaje:English
Publicado: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2013.
Edición:1st ed. 2013.
Materias:
Tabla de Contenidos:
  • Principles and statues of nanoimprint lithography
  • Stamp Fabrication
  • stamp surface treatment
  • Nanoimprint lithography resists
  • Nanoimprint lithography process
  • Modeling and Simulation of NIL
  • Application of NIL in Light emitting Diodes
  • Application of NIL in memory devices
  • Application of NIL in solar cell.