Resolution improvements on poly(methyl methacrylate) as electron-beam lithography resist /

Bibliographic Details
Main Author:	Arrieta Navarro, José Pablo 1987- (Autor/a)
Format:	Thesis Book
Language:	English
Published:	[San José], Costa Rica, 2012.
Subjects:	METACRILATO DE METILO LITOGRAFIA DE HACES ELECTRONICOS DISPERSION (FISICA) MEDICION

Description
Physical Description:	xii, 45 hojas : ilustraciones (algunas a color).

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