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02289nam a22003855i 4500 |
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978-3-540-76664-3 |
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20191027151826.0 |
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cr nn 008mamaa |
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100301s2008 gw | s |||| 0|eng d |
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|a 9783540766643
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|a 10.1007/978-3-540-76664-3
|2 doi
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|a Sistema de Bibliotecas del Tecnológico de Costa Rica
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|a Reactive Sputter Deposition
|c edited by Diederik Depla, Stijn Mahieu.
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|a 1st ed. 2008.
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|a Berlin, Heidelberg :
|b Springer Berlin Heidelberg :
|b Imprint: Springer,
|c 2008.
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|a XVIII, 572 p.
|b online resource.
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Springer Series in Materials Science,
|v 109
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|a Simulation of the Sputtering Process -- Electron Emission from Surfaces Induced by Slow Ions and Atoms -- Modeling of the Magnetron Discharge -- Modelling of Reactive Sputtering Processes -- Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering -- Transport of Sputtered Particles Through the Gas Phase -- Energy Deposition at the Substrate in a Magnetron Sputtering System -- Process Diagnostics -- Optical Plasma Diagnostics During Reactive Magnetron Sputtering -- Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect -- Reactively Sputter-Deposited Solid Electrolytes and Their Applications -- Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for “Transparent Electronics” -- Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering -- Atomic Assembly of Magnetoresistive Multilayers.
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|a Materials—Surfaces.
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|a Thin films.
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|a Condensed matter.
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|a Physical chemistry.
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|a Chemical engineering.
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|a Surfaces and Interfaces, Thin Films.
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|a Condensed Matter Physics.
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|a Physical Chemistry.
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|a Industrial Chemistry/Chemical Engineering.
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|a Depla, Diederik.
|e editor.
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|a Mahieu, Stijn.
|e editor.
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|a SpringerLink (Online service)
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|t Springer eBooks
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|u https://doi.org/10.1007/978-3-540-76664-3
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