Reactive Sputter Deposition
| Autor Corporativo: | |
|---|---|
| Otros Autores: | , |
| Formato: | eBook |
| Lenguaje: | English |
| Publicado: |
Berlin, Heidelberg :
Springer Berlin Heidelberg : Imprint: Springer,
2008.
|
| Edición: | 1st ed. 2008. |
| Colección: | Springer Series in Materials Science,
109 |
| Materias: | |
| Acceso en línea: | https://doi.org/10.1007/978-3-540-76664-3 |
Tabla de Contenidos:
- Simulation of the Sputtering Process
- Electron Emission from Surfaces Induced by Slow Ions and Atoms
- Modeling of the Magnetron Discharge
- Modelling of Reactive Sputtering Processes
- Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering
- Transport of Sputtered Particles Through the Gas Phase
- Energy Deposition at the Substrate in a Magnetron Sputtering System
- Process Diagnostics
- Optical Plasma Diagnostics During Reactive Magnetron Sputtering
- Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect
- Reactively Sputter-Deposited Solid Electrolytes and Their Applications
- Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for “Transparent Electronics”
- Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering
- Atomic Assembly of Magnetoresistive Multilayers.