Low Pressure Plasmas and Microstructuring Technology

Low Pressure Plasmas and Microstructuring Technology

Detalles Bibliográficos
Autor principal: Franz, Gerhard. (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: eBook
Lenguaje:English
Publicado: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2009.
Edición:1st ed. 2009.
Materias:
Optical materials.
Electronic materials.
Electronics.
Microelectronics.
Materials—Surfaces.
Thin films.
Atomic structure  .
Molecular structure .
Optical and Electronic Materials.
Electronics and Microelectronics, Instrumentation.
Surfaces and Interfaces, Thin Films.
Atomic/Molecular Structure and Spectra.
Acceso en línea:https://doi.org/10.1007/978-3-540-85849-2
Tabla de Contenidos:
  • Collisions and cross sections
  • The plasma
  • DC discharges
  • High-frequency discharges I
  • High-frequency discharges II
  • High-frequency discharges III
  • Ion beam systems
  • Plasma diagnostics
  • Plasma deposition processes
  • Plasma etch processes
  • Etch Mechanisms
  • Outlook
  • Advanced Topics.

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